3 results
Microstructure and Electrical Properties of III-As Gate Stacks with Amorphous Rare-Earth High-k Oxides
-
- Journal:
- Microscopy and Microanalysis / Volume 16 / Issue S2 / July 2010
- Published online by Cambridge University Press:
- 01 August 2010, pp. 1412-1413
- Print publication:
- July 2010
-
- Article
-
- You have access
- Export citation
Electrical and Structural Properties of MeV Si+ Ion Implantation in Silicon
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 378 / 1995
- Published online by Cambridge University Press:
- 26 February 2011, 71
- Print publication:
- 1995
-
- Article
- Export citation
The Influence of an In-Situ Electric Field on H+ and He+ Implantation Induced Defects in Silicon
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 316 / 1993
- Published online by Cambridge University Press:
- 22 February 2011, 105
- Print publication:
- 1993
-
- Article
- Export citation