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Silicon Surface Metal Contamination Measurements using Grazing-Emission XRF Spectrometry
Published online by Cambridge University Press: 10 February 2011
Abstract
Grazing-Emission X-Ray Fluorescence Spectrometry (GEXRF) is a new analytical X-ray fluorescence technique, which like TXRF takes advantage of the total-reflection phenomenon. The main advantage of GEXRF over TXRF is its sensitivity towards light elements. This paper presents straight GEXRF and VPD-DC-GEXRF analysis results for Na, Mg, Al, K and Ca surface contamination on silicon wafers.
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- Copyright © Materials Research Society 1997
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