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Reactive Gas Ion Beam Generation Using Single Atom W(111) Gas Field Ion Sources

Published online by Cambridge University Press:  25 July 2016

R. Urban ,
H. Moritani ,
R.A. Wolkow  and
J.L. Pitters
R. Urban
Affiliation:
Department of Physics, University of Alberta, Edmonton, AB, Canada National Institutes for Nanotechnology, Edmonton, AB, Canada
H. Moritani
Affiliation:
National Institutes for Nanotechnology, Edmonton, AB, Canada Hitachi High-Tech Science Corporation, Shizuoka, Japan
R.A. Wolkow
Affiliation:
Department of Physics, University of Alberta, Edmonton, AB, Canada National Institutes for Nanotechnology, Edmonton, AB, Canada
J.L. Pitters
Affiliation:
National Institutes for Nanotechnology, Edmonton, AB, Canada

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 616 - 617
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Kuo, H.-S., et al, Nanotechnology 20, 335701 (2009).CrossRefGoogle Scholar
[2] Wood, J., et al, Iridium single atom tips by field assisted reactive gas etching, accepted to Appl. Surf. Sci. (2015).CrossRefGoogle Scholar
[3] Muller, E.W. & Tsong, T.T. Field Ion Microscopy. Elsevier, New York (1969).CrossRefGoogle Scholar