Skip to main content Accessibility help
×
Home

Changes in Preferred Orientation of Pt Thin Films Deposited by dc Magnetron Sputtering Using Ar/O2 Gas Mixtures

  • Min Hong Kim (a1), Tae-Soon Park (a1), Euijoon Yoon (a1), Dong-Su Lee (a2), Dong-Yeon Park (a2), Hyun-Jung Woo (a2), Dong-Il Chun (a2) and Jowoong Ha (a2)...

Abstract

(200)-oriented Pt thin films were deposited on SiO2/Si substrates by dc magnetron sputtering using Ar/O2 gas mixtures. Oxygen incorporation into Pt films changed deposition rate, resistivity, stress, and preferred orientation of the films. Increase in film resistivity and decrease in tensile stress were presumed to be the results of the incorporated oxygen into grain boundaries, while the change of preferred orientation resulted from the oxygen incorporation into the Pt lattice. The preferential growth of (200) planes with less total strain energy from the incorporated oxygen resulted in strong (200) preferred orientation in Pt films.

Copyright

References

Hide All
1.Moazzami, R., Semicond. Sci. Technol. 10, 375 (1995).
2.Al-Shareef, H. N., Gifford, K. D., Rou, S. H., Hren, P. D., Auciello, O., and Kingon, A., Integrated Ferroelectronics 3, 321 (1993).
3.Hren, P. D., Rou, S. H., Al-Shareef, H. N., Ameen, M. S., Auciello, O., and Kingon, A. I., Integrated Ferroelectrics 2, 311 (1992).
4.Hwang, C. S., Park, S. O., Kang, C. S., Cho, H-J., Kang, H-K., Ahn, S. T., and Lee, M.Y., Jpn. J. Appl. Phys. 34, 5178 (1995).
5.Al-Shareef, H. N., Bellur, K. R., Auciello, O., and Kingon, A. I., Ferroelectrics 152, 85 (1994).
6.Okuyama, M. and Hamakawa, Y., Int. J. Eng. Sci. 29, 391 (1991).
7.Ogawa, T., Senda, A., and Kasnami, T., Jpn. J. Appl. Phys. 30, 2145 (1991).
8.Kanno, I., Fujii, S., Kamada, T., and Takayama, R., Appl. Phys. Lett. 70, 1378 (1997).
9.Kim, S. and Baik, S., J. Vac. Sci. Technol. A 13, 95 (1995).
10.Narayan, J., Tiwari, P., Jagannadham, K., and Holland, O. W., Appl. Phys. Lett. 64, 2093 (1994).
11.Hecq, M., Hecq, A., and Liemans, M., J. Appl. Phys. 49, 6176 (1978).
12.Hecq, M. and Hecq, A., J. Vac. Sci. Technol. 18, 219 (1981).
13.Gittis, A. and Dobrev, D., Thin Solid Films 130, 335 (1985).
14.Oh, U. C. and Je, J.H., J. Appl. Phys. 74, 1692 (1993).
15.Stoney, G. G., Proc. R. Soc. London, Ser. A 82, 172 (1909).
16.Lee, D-S., Park, D-Y., Kim, M. H., Chun, D-I., Ha, J., and Yoon, E., in Thin Films—Structure and morphology, edited by Moss, S. C., Ila, D., Cammarata, R.C., Chason, E. H., Einstein, T. L., and Williams, E. D. (Mater. Res. Soc. Symp. Proc. 441, Pittsburgh, PA, 1997), p. 341.
17.Bennewitz, C.D., Westwood, W.D., and Brown, J.D., J. Appl. Phys. 46, 558 (1975).
18.Neff, N., Henkel, S., Hartmannsgruber, E., Steinbeiss, E., Michalke, W., Steenbeck, K., and Schmidt, H. G., J. Appl. Phys. 79, 7672 (1996).
19.Thornton, J. A., J. Vac. Sci. Technol. A 4, 3059 (1986).
20.CRC Handbook of Chemistry and Physics, 68th ed. (CRC Press Inc., Boca Raton, FL).
21.Alexander, P. M. and Hoffmann, R. W., J. Vac. Sci. Technol. 13, 96 (1976).
22.Machlin, E. S., Materials Science in Microelectronics: The Relationships between Thin Film Processing and Structure (Giro Press, New York, 1995), pp. 157171.
23.Lotgerling, F. K., J. Inorg. Nucl. Chem. 9, 113 (1959).
24. JCPDS 4–802.
25.Park, D-Y., Lee, D-S., Kim, M. H., Park, T-S., Woo, H-J., Yoon, E., Chun, D-I., and Ha, J., in Thin Films—Structure and morphology, edited by Moss, S. C., Ila, D., Cammarata, R. C., Chason, E. H., Einstein, T. L., and Williams, E. D. (Mater. Res. Soc. Symp. Proc. 441, Pittsburgh, PA, 1997), p. 335.
26.Kim, M. H., Park, T-S., Lee, D-S., Park, D-Y., Woo, H-J., Chun, D-I., Ha, J., and Yoon, E., J. Mater. Res. 14, 634 (1999).

Related content

Powered by UNSILO

Changes in Preferred Orientation of Pt Thin Films Deposited by dc Magnetron Sputtering Using Ar/O2 Gas Mixtures

  • Min Hong Kim (a1), Tae-Soon Park (a1), Euijoon Yoon (a1), Dong-Su Lee (a2), Dong-Yeon Park (a2), Hyun-Jung Woo (a2), Dong-Il Chun (a2) and Jowoong Ha (a2)...

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed.