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The laser shock processing implemented by a laser-induced high-pressure plasma which propagates into the sample as a shockwave is innovatively applied as a post-processing technique on HfO2/SiO2 multilayer coatings for the first time. The pure mechanical post-processing has provided evidence of a considerable promotion effect of the laser-induced damage threshold, which increased by a factor of about 4.6 with appropriate processing parameters. The promotion mechanism is confirmed to be the comprehensive modification of the intrinsic defects and the mechanical properties, which made the applicability of this novel post-processing technique on various types of coatings possible. Based on experiments, an interaction equation for the plasma pressure is established, which clarifies the existence of the critical pressure and provides a theoretical basis for selecting optimal processing parameters. In addition to the further clarification of the underlying damage mechanism, the laser shock post-processing provides a promising technique to realize the comprehensive and effective improvement of the laser-induced damage resistance of coatings.
The nonlinear absorption (NLA) properties of potassium dideuterium phosphate crystals at 515 nm under different excitation laser intensities are investigated with the Z-scan technique. Two critical intensities are highlighted: the critical intensity for exciting the NLA and the critical intensity of the multiphoton absorption mechanism transition. Experimental results indicate the existence of defect states located in the band gap, which can be manipulated by varying laser intensity. A model based on the change of multiphoton absorption mechanism induced by the transformation of defect species is proposed to interpret the experiments. Modeling results are in good agreement with the experiment data.
Rapid growth processing of KDP crystals was improved by employing continuous filtration to eliminate bulk defects. The performances of the KDP crystals, including scattering defects, laser damage resistance and transmittance, were measured and analyzed. Compared with rapid-grown KDP without continuous filtration, the transmittance in the near-infrared was increased by at least 2%, almost all of ‘micron size’ defects were eliminated and ‘sub-micron size’ defects were decreased by approximately 90%. Laser damage testing revealed that the laser-induced damage thresholds (LIDTs), as well as the consistency of the LIDTs from sample to sample, were improved greatly. Moreover, it identified that ‘micron size’ defects were the precursors which initiated laser damage at relative lower laser fluence (4–6 J cm−2), and there was a lower correlation between smaller size scattering defects and laser damage initiation. The improved consistency in the LIDTs, attributed to elimination of ‘micron size’ defects, and LIDT enhancement originated from the decreased absorption of the KDP crystals.
Well-aligned ZnO nanowires were synthesized by simple physical vapor deposition using c-oriented ZnO thin films as substrate without catalysts or additives. The synthesized ZnO nanowires have two typical average diameters: 60 nm in majority and 120 nm in minority. They are about 4ím in length and well aligned along the normal direction of the substrate. Most of the synthesized ZnO nanowires are single crystalline in a hexagonal structure and grow along the  direction. The c-oriented ZnO thin films control the growth direction. Photoluminescence spectrum was measured showing a single strong ultraviolet emission (380 nm). Such result indicates that the ZnO nanowire arrays can be applied to excellent optoelectronic devices.
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