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Achieving Uniform and Conformal ALD Coatings on Sub-10nm Pores Using Dual-Stage Exposure/ Purge at Optimized Growth Temperatures
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- Journal:
- MRS Advances / Volume 3 / Issue 45-46 / 2018
- Published online by Cambridge University Press:
- 10 April 2018, pp. 2833-2839
- Print publication:
- 2018
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- Article
- Export citation