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We have studied the improvement of the quality of undoped a-Si:H deposited by remote-plasma chemical vapour deposition. The effects of reactant gas concentration, rf power, substrate bias voltage on the electrical and optical properties have been investigated. Some hydrogen dilution of si lane improves the photoeletric property and a high rf power gives rise to the defect creation due to the ion bombardment on the growing surface. The positive substrate bias improves the quality of undoped a-Si:H.
The ordered structure in a (100) GaAs0.5 Sb0.5 epilayer grown by molecular beam epitaxy has been studied by transmission electron microscopy. Domain structures are observed in dark field images of superstructure reflections. The ordered structure is derived by the analysis of diffraction patterns taken from single domains. The ordered structure is described as an alternate stacking of As and Sb planes in the <111> direction of the FCC sublattice. The alternate stacking of As and Sb plane is directly observed by high resolution electron microscopy.
Primitive (001) surfaces contain only biatomic (ao/2) steps and thereby provide a topological way of suppressing antiphase domain formation in polar materials heteroepitaxially grown on nonpolar (001) substrates. We show that thermodynamic equilibrium is a necessary and sufficient condition to form primitive (001) Si surfaces due to a π-bonded step reconstruction that lowers the relative enthalpy of reconstructed  biatomic steps by 0.04 eV per step atom, and to correlation, which freezes out the step configurational entropy thereby suppressing the formation of all other types of steps. Implications for general vicinal (001) Si surfaces are discussed.
A transmission electron microscope study of HqTe-CdTe multilayer structures grown by molecular beam epitaxy (MBE) on (100) Cd Zn Te is presented. Both cross-sectional and plain-view observations show highly reaular structures of superlattices and tunnel structures. Dislocation densities estimated by Plan-view observations are of the order of 104 cm−2 in these multilayer structures. A quantitative characterization of interface sharpness of superlattices has been carried out by intensity analysis of satellite spots in electron diffraction patterns. It is shown that interfaces in these superlattices are hichly abrupt with a width of one or two monolayers. These observations suggest the effectiveness of the use of lattice-matched substrates to qrow high quality HgTe-CdTe multilayer structures.
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