2 results
Post-CMP Cleaning of W and SiO2: A Model Study
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 386 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 109
- Print publication:
- 1995
-
- Article
- Export citation
Physical and Electrical Properties of Tantalum Oxide Thin Films Deposited by Low Pressure Chemical Vapor Deposition
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 284 / 1992
- Published online by Cambridge University Press:
- 22 February 2011, 499
- Print publication:
- 1992
-
- Article
- Export citation