Evaluations of molecular mechanisms of dietary plants with their active molecules are essential for the complete exploration of their nutritive and therapeutic value. In the present study, we investigated the effect of chicory (Cichorium intybus) salad leaves in inhibiting protein tyrosine phosphatase 1B (PTP1B), and evaluated their role in modulating the key markers involved in insulin cell signalling and adipogenesis using 3T3-L1 adipocytes. Bioactivity-directed purification studies enlightened the additive effects of chlorogenic acid (CGA) along with other caffeic acid derivatives present in methanolic extract of C. intybus (CME). Incubation of CME and CGA with 3T3-L1 adipocytes significantly enhanced the 2-deoxy-d-3[H]-glucose uptake and inhibited adipogenesis through altering the expressions of insulin signalling and adipogenesis markers. Extending to an in vivo model, the effect of CME was also investigated on insulin sensitivity in high-fat diet with low streptozotocin-induced diabetic rats. Supplementation of CME for 2 weeks reinstated the insulin sensitivity along with plasma metabolic profile. The present results demonstrate that the caffeoyl derivatives of chicory salad leaves show promising pharmacological effect on energy homoeostasis via PTP1B inhibition both in vitro and in vivo.

Block copolymers (BCPs) consist of two or more chemically distinct and incompatible polymer chains (or blocks) covalently bonded. Due to the incompatibility and connectivity constraints between the two blocks, diblock copolymers spontaneously self-assemble into microphase-separated nanoscale domains that exhibit ordered 0, 1, 2 or 3 dimensional morphologies at equilibrium. Commonly observed microdomain morphologies in bulk samples are periodic arrangements of lamellae, cylinders, or spheres. Block copolymer lithography refers to the use of these ordered structures in the form of thin films as templates for patterning through selective etching or deposition. The self-assembly and domain orientation of block copolymers on a given substrate is critical to realize block copolymer lithography as a tool for large throughput nanolithography applications. In this work, we survey the morphology of cylinder-forming block copolymers by atomic force microscopy (AFM). Three kind of block copolymers were studied: a) poly(styrene-block-ferrocenyldimethylsilane), PS-b-PFS b) poly(styrene-block-methylmethacrylate), PS-b-PMMA and c) poly(styrene-block-dimethylsiloxane) PS-b-PDMS. Block copolymers were dissolved in a neutral solvent for both blocks (toluene) in order to obtain solutions of various concentrations (1 and 1.5 wt %). From these solutions, films were prepared by spin casting on ultrananocrystalline diamond (UNCD) thin film substrates. Results indicate that PS-b-PFS exhibits chemical and morphological compatibility to the UNCD surface in terms of wetting and domain control. A systematic comparison of self-assembly of these polymers on silicon nitride substrates demonstrates that UNCD thin films would require pre-treatment to be considered as a substrate for BCP lithography.

Thin films of 8 mol% yttria-stabilized zirconia (YSZ) of thickness ranging from 15nm-500nm have been deposited on Si3N4(90nm)/Si substrates by RF sputtering at room temperature. These samples have been studied using in situ ion scattering techniques including Rutherford backscattering spectrometry (RBS) and nuclear reaction analysis (NRA) to analyze the oxygen distribution and defect chemistry as a function of annealing in various oxidizing and reducing ambient upto 500°C. In addition, the structural quality of these films after long time annealing has been investigated using grazing incidence X-ray diffraction (GIXRD). Temperature dependent X-ray absorption spectroscopy (XAS) has been performed to study the unoccupied density of states and chemical nature of YSZ. In this paper, we will discuss in detail the effects of annealing in different ambient on the defect chemistry, structure and stability of films in these materials systems.