Skip to main content Accessibility help

We use cookies to distinguish you from other users and to provide you with a better experience on our websites. Close this message to accept cookies or find out how to manage your cookie settings.

Close cookie message
×
  1. Home
  2. Search

Refine search

Refine search

Access:
Content type:
Publication date:
Apply   From and To filters
Subject: Show more
Journals Show more
Publishers: Show more
Societies Show more
Series: Show more
Collections: Show more

Actions for selected content:

Select all | Deselect all
  • View selected items
  • Export citations
  • Download PDF (zip)
  • Save to Kindle
  • Save to Dropbox
  • Save to Google Drive

Save Search

You can save your searches here and later view and run them again in "My saved searches".

Please provide a title, maximum of 40 characters.
Cancel
×

1 results

  • Ellipsometric Investigation of Metal-Organic Chemical Vapor Deposition of Niobium Oxide Films

  • Tobias Gerfin, Michael Graetzel
  • Journal:
    MRS Online Proceedings Library Archive / Volume 363 / 1994
    Published online by Cambridge University Press:
    15 February 2011, 45
    Print publication:
    1994

  • Niobium oxide films have been prepared by metal-organic chemical vapor deposition (MOCVD) in two different systems via thermal decomposition of Nb(OEt)5.A detailed study by exsitu variable-angle spectroscopic ellipsometry indicates a wavelength dependence of the refractive index that could be described by a Cauchy type dispersion formula and typical values of 1.9 to 2.1 at 632.8nm. The band gap of these films were at about 3.5 and 4eV for the indirect and direct transition. Preliminary results of in-situ ellipsometry at four different wavelengths in the visible and UV will be discusssed. The films were amorphous, extremely smooth and pinhole free and therefore they are useful candidates for interdiffusion barrier layers.