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Ultra Shallow Incorporation of Nitrogen into Gate Dielectrics by Pulse Time Modulated Plasma
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- Journal:
- MRS Online Proceedings Library Archive / Volume 786 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E3.9
- Print publication:
- 2003
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- Article
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ECR Plasma Etching Technology for ULSIs
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- Journal:
- MRS Online Proceedings Library Archive / Volume 223 / 1991
- Published online by Cambridge University Press:
- 16 February 2011, 97
- Print publication:
- 1991
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- Article
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