thin films on Si and fused-SiO2
substrates were prepared using ion-beam sputtering deposition. Films with x
= 0.69 and x = 0.49 were characterised by X-ray diffraction and conversion
electron Mössbauer spectroscopy experiments, and concurrently the
elastic and plastic behaviours were investigated through indentation tests.
For x = 0.69, the paramagnetic bcc structure is observed, while the
indentation modulus and hardness values are found to be 160 and 8.7 GPa,
respectively. For x = 0.49, a strongly
-textured paramagnetic phase
is evidenced, having the A15 structure. Mössbauer measurements also
allowed the site occupancy to be determined. The structural change from bcc
to A15 phase yields a 50% increase in hardness, while the indentation
modulus remains unchanged. This particular behaviour is discussed in terms
of distances between near neighbours and Burgers vector length in both bcc
and A15 structures. The results obtained here provide motivation to pursue
the present study through wear experiments.