Direct access to a T2-Moss eutectic microstructure with a nominal composition of Mo-9Si-18B (at.%) was obtained using an optical floating zone method at a growth rate of less than 5mm/h. The Mo-9Si-18B two-phase alloy has relatively high 0.2% proof stress at 1500°C of about 700 MPa and fracture toughness at room temperature (RT) of ∼11 MPaVm. The (Mo,Nb)-19.5Si-B alloys with (Mo,Nb)ss-T1-T2 three-phase eutectic microstructure have lower yield stress at 1500°C and fracture toughness at RT lower than the Mo-9Si-18B two-phase alloy. The dense short rod-type morphology of Moss in the Mo-9Si-18B alloy may be pulled out of T2 matrix and crack bridging may play a crucial role in toughening. Due to the limited ductility of Mo at RT, its morphology is more important rather than its volume fraction in improving the fracture toughness of multi-phase alloys.
Silicide coating on the Mo-9Si-18B alloys with the T2-Moss two-phase microstructure using a halide-activated pack cementation was also examined. The B-doped Mo5Si3 layer with the D8m structure was formed on the substrate after oxidation at 1500°C for 24 hours. The substrate is the source of B atoms. A steady-state weight gain was observed at 1300–1500°C and their steady-state constants are almost equal to those of MoSi2. The weight loss was saturated in 16–26 cycles at 1500°C. It was about -0.4mg/cm2, suggesting thermal stress resistance of the coated Mo-9Si-18B two-phase alloys is sufficient in the present condition.