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Ultra-Low Energy Ion Implantation of Si into HfO2 and HfSiO-based Structures for Non Volatile Memory Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1250 / 2010
- Published online by Cambridge University Press:
- 01 February 2011, 1250-G01-07
- Print publication:
- 2010
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- Article
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Ultra-Low energy Ion Implantation of Si into HfO2-based layers for Non Volatile Memory Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1160 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1160-H01-03
- Print publication:
- 2009
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- Article
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