Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

The effect of annealing in diluted oxygen on the structural characteristics of thin silicon dioxide layers with embedded Si nanocrystals fabricated by ultra-low energy ion implantation (1 keV) is reported. The nanocrystal characteristics (size, density, coverage) have been measured by spatially resolved Electron Energy Loss Spectroscopy using the spectrum-imaging mode of a Scanning Transmission Electron Microscope. Their evolution has been studied as a function of the annealing duration under N2+O2 at 900°C. An extended spherical Deal-Grove model for the self-limiting oxidation of embedded silicon nanocrystals has been carried out. It shows that stress effects, due to the deformation of the oxide, slows down the chemical oxidation rate and leads to a self-limiting oxide growth. The model predictions show a good agreement with the experimental results.

Scalability and performance of current flash memories can be improved substantially by novel devices based on Multi-Dot Floating Gate MOSFETs. The multi-dot layer in the very thin gate oxide can be fabricated CMOS-compatibly by ion beam synthesis (IBS). Here, we present both experimental and theoretical studies on IBS of multi-dot layers consisting of Si nanocrystals (NCs). The NCs are produced by ultra low energy Si+ ion implantation, which causes a high Si supersaturation in the shallow implantation region. During post-implantation annealing, this supersaturation leads to phase separation of the excess Si from the SiO2. Till now, the study of this phase separation suffered from the weak z contrast between Si and SiO2 phases in Transmission Electron Microscopy (TEM). Here, this imaging problem is solved by Energy Filtered Scanning Transmission Electron Microscopy (EFSTEM). Additionally, kinetic lattice Monte Carlo simulations of Si phase separation have been performed and compared with EFSTEM images. It has been predicted theoretically that the morphology of the multi-dot Si floating gate changes with increasing ion fluence from isolated, spherical NCs to percolated spinodal Si pattern. These patterns agree remarkably with EFSTEM images. However, the predicted fluence for spinodal pattern is lower than the experimental one. Because oxidants of the ambient atmosphere penetrate into the as-implanted SiO2, a substantial fraction of the implanted Si is lost due to oxidation.

EELS fine structures on characteristic core edges are closely related to the bonding type and structural environment around the excited atoms. Consequently, they constitute useful hints for investigating the electronic properties at interfaces. One major difficulty then lies in the extraction of the information relevant to the involved atoms, from that due to neighbouring atoms on both sides of the selected interface seen end on by the impinging electrons. We have investigated possible ways to reach this goal, using the spectrum-line method, which consists in acquiring sequences of spectra at well defined increments (0.3 nm) while scanning a subnanometer electron probe (0.7 nm) across the interface. This approach constitutes one step forward with respect to the spatial-difference (SD) method which processes spectra acquired on two adjacent areas, one encompassing the interface, the other one on a reference area nearby. A normalized version (NSD) has been introduced to extend its field of application from grain boundaries to heterophase interfaces in order to enhance their specific ELNES contribution

The sophisticated acquisition procedures now available in time or space resolved spectroscopies, also known as spectrum-imaging modes, produce large amounts of data which require specific developments for efficient processing and information extraction. For instance, in electron energy-loss spectroscopy (EELS), a line-spectrum consists of typically one hundred spectra recorded at regular intervals when scanning the subnanometer incident electron probe across the feature of interest: interfaces, multilayers or nanostructures of various shapes and dimensions. The useful information in any of these spectra depends on many factors such as the problem under investigation, the involved energy-loss range or the signal-to-noise ratio of the different features. However it is generally contained in the spectral changes, as well in energy channel as in position along the sequence.

To detect, measure and identify these variations, new methods have to be developed and the accompanying algorithms to be implemented. A first category encompasses all the routines which apply successively to all spectra in the sequence the well-known software which have been elaborated for processing individual spectra.

The structural evolution of Au/Ni multilayers (with an increasing number of Ni monolayers (MLs)) has been investigated by HREM. As soon as the thickness of Ni becomes larger than 5 MLs, a structural change occurs which in fact has been predicted by numerical simulations. The deformation in the multilayer has been characterised by HREM image processing and has been related to the Ni profile. This profile has been compared to the chemical profile obtained by scanning PEELS analysis through the multilayer.