Semiconductor production using 8-inches wafers seems to be widely carried out in semiconductor factories. Many FE-SEMs are coming to be used for their particle/defect inspection. As semiconductor processing turns precise, the need of a high resolution FE-SEM has been rising all the more.
Now, JEOL announces a high resolution FE-SEM (8"FE-SEM) for 8-inches wafer inspection, which takes over the strong point of the semi-in-lens field emission scanning electron microscope (FE-SEM) JSM-6340F which has been getting expensive evaluation with its high resolution performance. The 8"FE-SEM possesses a resolution of 3.0nm at lkV of its acceleration voltage and 1.2nm at 15kV, as its semi-in-lens type object lens makes it possible to minimize the aberration.
High resolution observation and inclined wafer observation can be selected properly by changing the wafer holder, as such a holder exchange system has been usually used for transmission electron microscopes.