We present the data and initial results from the first pilot survey of the Evolutionary Map of the Universe (EMU), observed at 944 MHz with the Australian Square Kilometre Array Pathfinder (ASKAP) telescope. The survey covers $270 \,\mathrm{deg}^2$ of an area covered by the Dark Energy Survey, reaching a depth of 25–30 $\mu\mathrm{Jy\ beam}^{-1}$ rms at a spatial resolution of $\sim$ 11–18 arcsec, resulting in a catalogue of $\sim$ 220 000 sources, of which $\sim$ 180 000 are single-component sources. Here we present the catalogue of single-component sources, together with (where available) optical and infrared cross-identifications, classifications, and redshifts. This survey explores a new region of parameter space compared to previous surveys. Specifically, the EMU Pilot Survey has a high density of sources, and also a high sensitivity to low surface brightness emission. These properties result in the detection of types of sources that were rarely seen in or absent from previous surveys. We present some of these new results here.

Using a novel experimental set-up, we examine the stability of an axisymmetric dense current of fluid on a sloping bottom in a rotating frame of reference. In a cylindrical tank on a rotating table, saline fluid is injected through an annular mesh encircling a cone of 1/15 slope. The resulting ring of fluid becomes unstable to periodic sinusoidal waves, whose characteristics are examined as a function of the ambient fluid depth, the rotation rate, and the salinity and depth of the dense current, the latter being related to the injection time. For experiments with relatively low-salinity currents, we find the phase speed of the instability is proportional to the rotation rate, $\Omega$, rather than being proportional to the Nof speed, which varies as $1/\Omega$. Likewise, the number of waves observed is found to be inconsistent with existing theories for baroclinic instability of a dense current on a sloping bottom with a stationary ambient.

Surface tracers reveal that significant currents are induced in the ambient by the injection of the saline fluid and we propose that it is the coupling between the surface and bottom flow that ultimately controls the observed dynamics. In particular, we propose that barotropic instability of the surface flow controls the behaviour of the low-salinity current and, using potential vorticity conservation, we predict the phase speed of the instability should indeed be proportional to $\Omega$. The experimental results are also compared with related work in which eddies and Ekman layers evolve from dense fluid injected from a localized source.

Near stoichiometric titanium nitride (TiN) was deposited from tetrakis(dimethylamido)titanium (TDMAT) and ammonia using atmospheric pressure chemical vapor deposition. Experiments were conducted in a belt furnace; static experiments provided kinetic data and continuous operation uniformly coated 150-mm substrates. Growth rate, stoichiometry, and resistivity are examined as functions of deposition temperature (190−420 °C), ammonia flow relative to TDMAT (0−30), and total gas-flow rate (residence time 0.3−0.6 s). Films were characterized by sheet resistance measurements, Rutherford Backscattering Spectrometry, and X-Ray Photoelectron Spectrometry. Films deposited without ammonia were substoichiometric (N/Ti, 0.6−0.75), contained high levels of carbon (C/Ti = 0.25−0.40) and oxygen (O/Ti = 0.6−0.9), and grew slowly. Small amounts of ammonia (NH3/TDMAT ≥ 1) brought impurity levels down to C/Ti, 0.1 and O/Ti = 0.3−0.5. Ammonia increased the growth rates by a factor of 4−12 at temperatures below 400 °C. Films 500 Å thick had resistivities as low as 1600 μΩ-cm when deposited at 280 °C and 1500 μΩ-cm when deposited at 370 °C. Scanning electron micrographs indicate a smooth surface and poor step coverage for films deposited with high ammonia concentrations.

Titanium nitride films were formed by chemical vapor deposition from titanium tetrabromide and ammonia at atmospheric pressure and substrate temperatures from about 400 to 600 °C. Although titanium tetrabromide is a highly hygroscopic solid at room temperature, it can be handled conveniently as a very concentrated liquid solution (85 weight percent) in bromine as a solvent. This solution can be vaporized by a direct liquid injection system. Alternatively, the solution can be pumped into a bubbler, from which the bromine solvent is then removed by fractional distillation. Rutherford Backscattering Spectroscopy was used to determine that the bromine content of TiN deposited at 500°C was about one atomic per cent. Growth rates were about 17 nm/min, and electrical resistivity was found to be about 200 μΩ-cm.

Titanium nitride (TiN) films serve an important function as an adhesion layer and diffusion barrier in contact and via plug structures of ULSI devices. In this work, TiN films were deposited by chemical vapor deposition (CVD) at atmospheric pressure using the tetrakis (dimethylamido) titanium (TDMAT) and tetrakis (diethylamido) titanium (TDEAT) organic precursors over a range of temperatures and ammonia partial pressures. The step coverage and morphology of these films was evaluated at these various conditions by SEM of cross-sectioned contacts. In addition, material properties such as resistivity. surface roughness, and stoichiometry were assessed at some of the operating conditions.