4 results
Planarization Specification for 22nm and Beyond BEOL CMP
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1249 / 2010
- Published online by Cambridge University Press:
- 01 February 2011, 1249-E01-04
- Print publication:
- 2010
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Cu CMP Edge Uniformity Improvement Studies for 32 nm Technology Node and Beyond
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1249 / 2010
- Published online by Cambridge University Press:
- 01 February 2011, 1249-E01-06
- Print publication:
- 2010
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From Process Assumptions to Development to Manufacturing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1079 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1079-N02-01
- Print publication:
- 2008
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Modeling of Pattern Density Dependent Pressure Non-Uniformity at a Die Scale for ILD Chemical Mechanical Planarization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 816 / 2004
- Published online by Cambridge University Press:
- 15 March 2011, K4.4
- Print publication:
- 2004
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