High quality Sn-doped In2O3 (ITO) thin films have been grown by pulsed laser deposition (PLD) on glass, flexible polyethylene terephthalate (PET) and single crystal yttria stabilized zirconia (YSZ) substrates for use in organic light emitting diodes (OLEDs). Critical electrode issues for the OLED are related to the optical transparency, electrical resistivity, work function and surface roughness of the ITO film. Our research has focused on improving the properties of the ITO film to increase the efficiency of the OLED. Films were deposited using a KrF excimer laser (248nm, 30 ns FWHM) at fluences of 2 J/cm2 at substrate temperatures ranging from 1 to 100 mTorr. For ITO films (∼ 100 nm thick) deposited at the optimized conditions, a resistivity of 4.1 × 10-4 Ω-cm, 2.2 × 10-4 Ω-cm, 1.8 × 10-4 Ω-cm was observed on PET, glass and YSZ, respectively. The average film transmission in the visible range (400 - 700 nm) was about 90 % and the film surface roughness was about 0.5 nm for the film grown on glass. The Hall mobility and carrier density for ITO films (300 nm thickness) were observed to be in the range of 28 - 34 cm2/V-s and 1.0 - 1.2 × 1021 cm-3, respectively. We have used the ITO films, deposited by PLD on glass, plastic and single crystal YSZ substrates, as an anode contact in OLEDs. The OLED device performance based on PLD ITO anodes is compared with that of the device fabricated on the commercial ITO anode.

BaxSr1−xTiO3 (BST, x=0.5 and 0.6) thin films have been deposited onto (100) MgO single crystal substrates by pulsed laser deposition (PLD). The room temperature capacitance and dielectric quality factor (Q=1/tanδ have been measured as a function of electric field (≤ 100 kV/cm) at microwave frequencies (1 to 20 GHz) using silver interdigitated electrodes deposited on top of the BST film. It has been observed that the dielectric constant of the film and its change with electric field are closely related to film phase (amorphous to crystalline phase) and film strain which affects the ionic polarization of the film. Amorphous BST films show high dielectric Q (> 100) with low dielectric constant (∼30–200) and low dielectric tuning (< 1%), presumably due to small ionic polarization. Crystalline films have a higher dielectric constant (∼1000–3000) and a higher dielectric tuning (∼ 65%) but a lower dielectric Q (∼20). As an optimal microstructure of the film for tunable microwave applications, strain-relieved large-grained (∼5000 Å) randomly oriented polycrystalline films were deposited using a thin amorphous buffer layer of BST (∼50 Å). Very large grains (size up to a few microns) were observed in BST films prepared using a thicker amorphous buffer layer (∼500 Å). We will present results on how careful control of microstructure can lead to films with optimal dielectric properties for the tunable microwave devices.

Single phase, (001) oriented SrBi2Ta2O9(SBT) thin films have been deposited on (100) MgO substrates using pulsed laser deposition(PLD) technique. In order to study the influence of the growth conditions on the microstructure and stoichiometry, SBT film growth was carried out under different deposition conditions, using an Kr:F excimer laser (248 nm, 30 ns FWHM). Effect of laser fluence(0.75–2 J/cm2), frequency of the laser pulse (4–10 Hz), substrate temperature (700–850°C), oxygen partial pressure(150–450 mTorr) have been studied using X-ray diff-raction(XRD), Scanning Electron Microscope(SEM), X-ray energy dispersive analysis (EDAX), atomic force microscopy(AFM). It was found that small variation in growth temperature and oxygen pressure has a large influence on the average grain size (50–180 nm) and surface roughness (0.14–0.3 nm) respectively. Outgrowths on the film surface were observed at high substrate temperatures, high laser energy and with higher frequencies (>6) of the laser pulse. Highly c-axis oriented SBT thin films with homogeneous surface morphology and with an average surface roughness of 0.14 nm were deposited at 750 °C, 260 mTorr O2 pressure and 1.25 J/cm2 laser fluence. These films have a tangent loss around 0.05 and dielectric constant around 417 with a tunability of 4% in the microwave frequency region (1–20 GHz).

Single phase BaxSr1−xTiO3 (BST) films (∼0.5-7 μm thick) have been deposited onto single crystal substrates (MgO, LaAlO3, SrTiO3) by pulsed laser deposition. Silver interdigitated electrodes were deposited on top of the ferroelectric film. The room temperature capacitance and dielectric Q (1/tanδ) of the film have been measured as a function of electric field (≤80 kV/cm) at 1 - 20 GHz. The dielectric properties of the film are observed to strongly depend on substrate type and post-deposition processing. After annealing (≤1000° C), it was observed that the dielectric constant and % tuning decreased and the dielectric Q increased for films deposited onto MgO, and the opposite effect was observed for films deposited onto LaA1O3. Presumably, this change in dielectric properties is due to the changes in film stress. Very thin (∼50 Å) amorphous BST films were successfully used as a stress-relief layer for the subsequently deposited crystalline BST (∼5000 Å) films to maximize % tuning and dielectric Q. Films have been deposited from stoichiometric targets and targets that have excess Ba and Sr. The additional Ba and Sr has been added to the target to compensate for deficiencies in Ba and Sr observed in the deposited BST (x=0.5) films. Films deposited from compensated targets have higher dielectric constants than films deposited from stoichiometric targets. Donor/acceptor dopants have also been added to the BST target (Mn, W, Fe ≤4 mol.%) to further improve the dielectric properties. The relationship between the dielectric constant, the dielectric Q, the change in dielectric constant with electric field is discussed.

Single phase BaxSr1−xTiO3 (x=0.5 and 0.6) thin films (∼5000Å thick) have been deposited onto (100) MgO single crystal substrate with (Ba,Sr) compensated and/or (Mn,Fe,W) doped targets using pulsed laser deposition (PLD). The room temperature capacitance (C) and dielectric Q (1/tanδ) have been measured at microwave frequencies of I to 20 GHz as a function of electric field (0-80kV/cm). Microstructural defects associated with cation and anion vacancies have been observed in BaxSr1−xTiO3 films. Compensation of the ablation target with excess Ba and Sr tends to increase the dielectric constant and the dielectric Q. A film deposited with (Ba,Sr) compensated target has been obtained with 25% tuning, where % tuning is defined as {(C(0)-C(E))/C(O))×100, and dielectric Q of ∼ 100 at room temperature (1 — 10 GHz) for DC bias field (E=67 kV/cm). A further increase in the dielectric Q is observed by the addition of donor/acceptor dopants such as Mn, Fe, and W (Q≈100-240). The effects of (Ba, Sr) compensation and (Mn,Fe,W) doping on the film structure and dielectric properties are discussed.

KTa1−xNbxO3 (KTN) thin films (-6000 Å) were grown on (100) MgO, (100) LaAlO3 (LAO), and (100) SrTiO3(STO) substrates by pulsed laser deposition (PLD). Deposited films were smooth, single phase and exclusively (100) oriented. KTN films deposited on MgO and LAO substrates were easily cracked after deposition or post deposition heat treatment. The film deformation appeared to be caused by strain due to the lattice mismatch between the film and the substrate. A thin buffer layer of ∼100 Å was used to eliminate the cracking problem. The high volatility of K at the film deposition temperature required excess K to be added to the ablation target. Sintering of the target and post-deposition annealing of the films were done in a sealed Pt coated stainless steel container. Rutherford backscattering showed the films to have a 1 to 1 atomic ratio of K to Ta + Nb. On top of the KTN films, Ag interdigitated capacitors were deposited. Room temperature measurements of capacitance and dielectric loss as a function of bias electric field (0 -80 kV/cm) at 1 to 20 GHz were made. Capacitance and dielectric loss measurements were made as a function of temperature and bias electric field at one MHz and as a function of temperature and frequency at 0V DC bias. The results show the strong potential of KTN for use in frequency agile microwave electronics.

Single phase, (100) oriented Ba0.5Sr0.5TiO3 films have been deposited by pulsed laser deposition onto (100) LaAIO3, SrTiO3, MgO substrates. The dielectric properties of these films were measured using interdigitated capacitors as a function of DC bias and temperature at 1 MHz and as a function of DC bias at 1 to 20 GHz at room temperature. Deposited films were annealed over a temperature range of 900 to 1350 C for 1 to 8 hours to observe its effect on dielectric properties. Chemical analysis on films deposited from stoichiometric targets showed the films to be up to 6% deficient in Ba and Sr under typical PLD deposition conditions. Optimal annealing conditions and target stoichiometries for minimizing dielectric loss and maximizing tuning are discussed.

High-quality thin-film superlattices of permalloy (NiFe) and silver (Ag) have been grown by pulsed laser deposition (PLD) for the first time. The alternating metallic layers weregrown from individual NiFe and Ag targets utilizing an automated multi-target holder coupled to a conventional PLD system. The targets were ablated at a base pressure of 4×10−7 Torr and the material deposited on room-temperature (100) silicon and on fused silica substrates. The films were characterized by X-ray diffraction (XRD), magnetic field-dependent resistivity, and ferromagnetic resonance (FMR). XRD was used to confirm uniform bilayer thicknesses. The magnetic field-dependent resistance measurements indicated the presence of magnetoresistance in the deposited films. An as-deposited film with a bilayer thickness of 75 Å demonstrated a roomtemperature magnetoresistive effect of 0.15 %. FMR has been used to determine the relationship between NiFe magnetism and the observed magnetoresistance.

Control of composition and phase of a series of MoNx thin films has been accomplished by reactive pulsed laser deposition (PLD). Molybdenum foil targets were ablated in a background gas of N2/H2 (10%) at pressures ranging from 40 to 120 mTorr. the MoNx films were deposited simultaneously onto (100) MgO and fused silica substrates. the films were characterized by X-ray diffraction (XRD), temperature-dependent resistivity, and Rutherford backscattering spectroscopy (RBS). the composition, phase, and electronic transport properties were found to depend on N2/H2 pressure, substrate temperature, and substrate orientation. the highest superconducting transition temperature (Tc ) was observed in a hexagonal Mo2N film where Tc (onset) ≈ 8 K. IN general, Tc was observed to correlate most closely with the N/Mo ratio. as the ratio of N/Mo increased above optimal M02N composition, Tc decreased. Films grown on MgO generally had higher N/Mo ratios and hence lower Tc values than films deposited on silic A.

The structure, morphology, and electrical properties of pulsed laser deposited NbNx (0 ≤ x ≤ 1.4) thin films have been investigated. Films were deposited from Nb metal targets on oriented MgO (100) and amorphous fused silica substrates as a function of substrate temperature and ambient pressure. A reducing atmosphere (N2 with 10% H2) was used to prevent oxide formation. At elevated temperatures, the N/Nb ratios of films deposited on MgO, as determined from Rutherford Backscattering Spectroscopy, increased from 0 −1.4 as the ambient pressure was varied from vacuum to 200 mTorr, respectively. NbNx films (x=l) were deposited at 600 °C and 60 mTorr. Both the structure and electrical properties of the deposited films varied strongly with the substrate type. On fused silica, NbN films were poorly crystalline with low critical temperatures (Tc ∼ 8 – 11 K) and low critical currents (Jc (4.2 K) ∼ 2 MA/cm2), whereas on MgO the NbN films were oriented and had better transport properties (Tc ∼ 16.4 K and Jc (4.2 K) = 7.1 MA/cm2).

The magnetic properties of MnZn-ferrite are greatly affected by the distribution and valence state of the magnetic and nonmagnetic metallic ions on the tetrahedral (A) and octahedral (B) sites in the spinel ferrite unit cell. A primary factor which can affect the distribution and valence state of the metallic ions is the stoichiometry of the ferrite. In this paper we report on the results of the site occupancy of the transition metal ions in a series of MnZn-ferrite films using extended x-ray absorption fine structure (EXAFS). The EXAFS data are correlated with the film composition and those magnetic properties which are sensitive to the ionic distribution (e.g., magnetic anisotropy field and magnetization) in order to confirm the use of EXAFS as a technique for the investigation of metallic ion distribution in spinel ferrites.

Thin films of diamond and diamond-like carbon (DLC) are technologically important materials that serve as hard, scratch resistant and chemically inert coatings for tools and optics. Recent calculations suggest that β-C3N4 should be harder than diamond. We have deposited carbon nitride (CNx) thin films by pulsed laser deposition. The films were grown from a graphite target in a nitrogen background. The nitrogen source was either (a) a N2 gas atmosphere, or (b) a N2+/N+ ion beam generated by a Kaufman ion gun. A wide range of deposition parameters were investigated, such as deposition pressure (0.3-900 mTorr N2), substrate temperature (50 and 600°C), and laser fluence (1-4 J/cm2) and laser repetition rate (1-10 Hz). The films have been characterized by Rutherford Backscattering Spectroscopy, thin-film X-ray diffraction, scanning electron microscopy, and micro-Raman spectroscopy. In general, the films were nitrogen deficient with a maximum nitrogen to carbon ratio (N/C) of 0.45 and a shift in the G band Raman peak consistent with amorphous CNx (a-CNx).