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Surface diffusion of a growth species is needed to give the observed smooth surface of hydrogenated amorphous silicon (a-Si:H). But what diffuses, the weakly bound SiH3 radical on the hydrogenated surface, or the bound SiH3 at a growth site. Diffusion is complicated by the change in the surface termination of a-Si:H as temperature rises. We use total energy pseudopotential calculations on a variety of periodic Si:H surface configurations to show that it is the weakly bound SiH3 that diffuses. We provide an overall energy scheme of the bound states and transport levels of SiH3 on a-Si:H surfaces.
Chemistry of co-evaporated CIGS surfaces submitted to chemical treatments relevant to fabrication steps were investigated by XPS and admittance spectroscopy. A Se XPS signal specific of the CIGS surfaces was identified. Surface states seen by Admittance and surface chemistry are seen to change significantly during the elaboration steps. Consequences for device elaboration are briefly discussed.
We report an optical investigation of single phase icosahedral Al59B3Cu25.5Fe12.5. The optical conductivity presents a striking depression at low frequencies and a prominent peak at 3 104 cm−1.A phenomenological analysis of the conductivity allows us to correlate the high energy excitations to a mechanism of electron hopping.
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