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Characterization of Surface Processes During Oxide CMP by in situ FTIR Spectroscopy With Microstructured Reflection Elements at Silicon Wafers
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1249 / 2010
- Published online by Cambridge University Press:
- 01 February 2011, 1249-E05-02
- Print publication:
- 2010
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- Article
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