The sudden outbreak of coronavirus disease-2019 (COVID-19) sparked widespread concern about organisational resilience in the management domain. The resources, operations and practices of organisational resilience have to be considered in particular contexts at different stages and in relation to numerous inputs, processes and outputs. Selected as one example, the preparation, response and development of a retail supermarket's management and operations in China is examined through an empirical case study. Supply chain and digital construction, improvisational ability, system management and corporate social responsibility all played a positive role in this organisation's response to the outbreak of COVID-19 (2019–2020) in the Chinese management context. Organisational resilience is reflected in the case study organisation's self-interested and altruistic policies and practices. The case provides valuable insights on efficacious management practices for organisational resilience building in the retail industry.

Deformation behavior of the BN film was dynamically observed by high-resolution transmission electron microscopy. BN thin films were deposited on a narrow edge of Si flakes, using inductively coupled plasma-enhanced chemical vapor deposition. High-resolution observation of the sample revealed that the BN film was possibly deposited on the edge of the Si thinned to less than 10 nm in thickness, whose morphology varied depending on the thickness of the Si edge. Intriguing mechanical properties of the BN films, especially relating their dynamic behavior, were clearly verified by the high-resolution observation with piezo-ceramic tube for three-axis positioning of an indenter.

Cubic boron nitride (cBN) thin films were deposited on silicon wafers by low-pressure inductively coupled plasma-enhanced chemical vapor deposition (ICP-CVD). By using special substrate pre-treatment processes including positive biasing treatment in H2 plasma or 1200 K pre-heating in H2 atmosphere followed by an N2 plasma treatment, turbostratic BN (tBN) intermediate layer was revealed to directly grow on Si substrates without an initial amorphous layer. The thickness of the tBN transition layer can be reduced to less than 3 nm.