Copper (I) oxide (Cu2O) is a direct band gap semiconductor with p-type conductivity and is a potential candidate for multi-junction solar cells. In this work, incoherent light source based photo-assisted metal-organic chemical vapor deposition (MOCVD) was used to deposit high quality Cu2O thin films on n-type <100> silicon and quartz substrates. X-ray diffraction studies reveal that crystalline Cu2O is deposited. UV-Vis-NIR spectroscopy results indicated a band gap of 2.44 eV for Cu2O thin films. Transmission electron spectroscopy results show that the Cu2O film grows in the form of three-dimensional islands composed of smaller nanocrystalline grains in the range of 10–20 nm. I–V measurements indicate that the Cu2O/n-Si device fabricated using the MOCVD process has a lower dark current density than other devices reported in the literature.

Chalcopyrite solar cells based on CuInSe2 and associated alloys have demonstrated high efficiencies, with current annual shipments in the hundreds of megawatts (MW) range and increasing. Largely due to concern over possible indium (In) scarcity, a related set of materials, the kesterites, which comprise Cu2ZnSnS4 and associated alloys, has received increasing attention. Similarities and differences between kesterites and chalcopyrites are discussed as drawn from theory, depositions, and materials characterization. In particular, we discuss predictions from density functional theory, results from vacuum co-evaporation, and characterization via x-ray diffraction, scanning electron microscopy, electron beam-induced current, quantum efficiency, secondary ion mass spectroscopy, and luminescence.

Solid state crystallization of hydrogenated amorphous silicon (a-Si:H) prepared by hot-wire CVD is studied in solid phase epitaxy mode. By using a novel optical method combined with cross-sectional TEM and SIMS, a reduction of epitaxial growth speed is observed with increase in a-Si:H film thickness. Namely, in films thinner that 0.5 micron, solid phase epitaxy velocity depends linearly on film thickness. As the film thickness increases beyond 1 micron, the average velocity of solid phase epitaxy decreases considerably with respect to that in thinner films. In this regime, its velocity becomes also time-dependent: initial slow propagation of crystallization front gets considerably accelerated after the front has traveled above 400nm. SIMS thickness profiles of hydrogen shows considerably more residual hydrogen in thicker films after the start of solid phase epitaxy. In addition, prolonged pre-dehydrogenation at lower temperatures results in the increase in the average epitaxy speed in thicker films. These phenomena are likely related to delayed hydrogen outdiffusion in thicker films, which also leads to time-dependent speed of the solid-phase epitaxy front. We conclude that excess residual hydrogen reduces the rate of solid-phase crystalline growth.

Polycrystalline thin-film CdTe is one of the leading materials used in photovoltaic solar cells. One way to improve device performance and stability is through understanding how various process steps alter defect states in the CdTe layer. Low-temperature photoluminescence (PL) studies show a 1.456-eV PL peak in single-crystal CdTe that is likely due to a Cui-OTe defect complex. A similar peak, observed in as-deposited glass/SnO2:F/CdS/CdTe thin-film structures, strongly suggests a common origin. The 1.456-eV peak is also seen in a thin-film sample after performing the CdCl2 treatment needed for high efficiencies.