The nanoindentation technique was used to determine the hardness and Young's modulus of thin C60 films irradiated with N ions. The pristine film, with thickness of 170 nm, was grown on a Si (111) substrate, with an intermediary layer of SiO2 50nm thick. An X-ray analysis reveals a fcc structure for the pristine C60 films. The N irradiation was performed with energy of 170 keV (Rp of 380nm) and fluences ranging from 5×1011 to 5×1015 ions.cm−2 . The loads used in the nanoindentation tests were from 0.05 to 16 mN in order to obtain information about the film, the interface and the substrate. The hardness and Young's modulus, for the pristine and irradiated films were compared considering normalised values at tip penetrations of 70 nm. For the C60 non-irradiated film, the hardness and the Young's modulus were 0.31 GPa and 23 GPa respectively. After N irradiation at fluences greater than 1013 ions.cm −2, the hardness and Young's modulus changed drastically, rising to 15 GPa and 170 GPa respectively at fluence of 5×1015. These results are discussed in terms of the energy transference mechanisms by the N ions into the C60 film.