3 results
Reducing density-induced CMP non-uniformity for advanced semiconductor technology nodes
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1560 / 2013
- Published online by Cambridge University Press:
- 21 August 2013, mrss13-1560-bb01-04
- Print publication:
- 2013
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- Article
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Optimizing Stressor Film Deposition Sequence in Polish Rate Order for Best Planarization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1335 / 2011
- Published online by Cambridge University Press:
- 23 June 2011, mrss11-1335-o03-01
- Print publication:
- 2011
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Cu CMP Edge Uniformity Improvement Studies for 32 nm Technology Node and Beyond
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1249 / 2010
- Published online by Cambridge University Press:
- 01 February 2011, 1249-E01-06
- Print publication:
- 2010
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- Article
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