3 results
Colloidal Silica based High Selectivity Shallow Trench Isolation (STI) Chemical Mechanical Polishing (CMP) Slurry
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W8.5
- Print publication:
- 2005
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- Article
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Modeling of Polishing Regimes in Chemical Mechanical Polishing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W5.9
- Print publication:
- 2005
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- Article
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Fundamentals of Slurry Design for CMP of Metal and Dielectric Materials
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- Journal:
- MRS Bulletin / Volume 27 / Issue 10 / October 2002
- Published online by Cambridge University Press:
- 31 January 2011, pp. 752-760
- Print publication:
- October 2002
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- Article
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