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Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal

Published online by Cambridge University Press:  15 May 2002

H. Nishiyama  and
M. Shigeta
H. Nishiyama*
Affiliation:
Institute of Fluid Science, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980-8577, Japan
M. Shigeta
Affiliation:
Institute of Fluid Science, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980-8577, Japan
*
nishiyama@ifs.tohoku.ac.jpshigeta@paris.ifs.tohoku.ac.jp
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Abstract

The functions of the plasma flow such as electrical conductivity, thermal conduction and chemical reaction can be enhanced by seeding vaporized alkali metal with low ionization potential. In the present study, numerical simulation is conducted for the radio frequency inductively coupled plasma of which functions are enhanced by seeding a small amount of vaporized alkali metal. The effects of seeding, injection flow rate and applied coil frequency on the plasma characteristics are clarified by relating to the flow structure and electromagnetic effect.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 18 , Issue 2 , May 2002 , pp. 125 - 133
Copyright
© EDP Sciences, 2002

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