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Investigation of the structure of tungsten oxide films obtained by chemical vapor deposition

Published online by Cambridge University Press:  15 September 2000

D. Gogova ,
K. Gesheva ,
A. Kakanakova-Georgieva  and
M. Surtchev
D. Gogova*
Affiliation:
Central Laboratory for Solar Energy and New Energy Sources at the Bulgarian Academy of Sciences, 72 Tzarigradsko shose Blvd., 1784 Sofia, Bulgaria
K. Gesheva
Affiliation:
Central Laboratory for Solar Energy and New Energy Sources at the Bulgarian Academy of Sciences, 72 Tzarigradsko shose Blvd., 1784 Sofia, Bulgaria
A. Kakanakova-Georgieva
Affiliation:
Linköping University, Department of Physics and Measurement Technology, Material Science Division, S-581 83 Linköping, Sweden
M. Surtchev
Affiliation:
Sofia University, Department of Physics, 5 James Boucher Blvd., Sofia, Bulgaria
*
dgogova@phys.bas.bg
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Abstract

Thin amorphous and polycrystalline tungsten oxide films have been prepared by Chemical Vapor Deposition (CVD) from metallorganic precursor − tungsten hexacarbonyl − at atmospheric pressure. The dependence of the composition and the structure of tungsten oxide films on the technological conditions has been investigated by XPS, XRD, DTA-TGA and Raman spectroscopy. As a result it has been established that: at high values of the flow-rates of the reaction gases amorphous films of very low density have been obtained; in the XPS spectra of the understoichiometric WO3−y (0 < y < 0.3) films besides W6+, also W5+ and W4+ stateshave been observed. First to observe in the Raman spectra of amorphous CVD-WO3 films is the band at ~ 950 cm−1,characteristic for terminalW6+ = O bonds in result of the presence of structural water. Theexistence of structural water in the amorphous material has been established by thermal analyze, also.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 11 , Issue 3 , September 2000 , pp. 167 - 174
Copyright
© EDP Sciences, 2000

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