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Dislocations in 6H-SiC and their influence on electrical propertiesof n-type crystals*

Published online by Cambridge University Press:  15 May 1998

V. Tillay
Affiliation:
Laboratoire de Métallurgie Physique (UMR 6630 CNRS), Université de Poitiers, Bd3-Téléport 2, 86960 Futuroscope Cedex, France
F. Pailloux
Affiliation:
Laboratoire de Métallurgie Physique (UMR 6630 CNRS), Université de Poitiers, Bd3-Téléport 2, 86960 Futuroscope Cedex, France
M. F. Denanot
Affiliation:
Laboratoire de Métallurgie Physique (UMR 6630 CNRS), Université de Poitiers, Bd3-Téléport 2, 86960 Futuroscope Cedex, France
P. Pirouz
Affiliation:
Department of Materials Science and Engineering, Case Western Reserve University, Cleveland, OH 44106, USA
J. Rabier
Affiliation:
Laboratoire de Métallurgie Physique (UMR 6630 CNRS), Université de Poitiers, Bd3-Téléport 2, 86960 Futuroscope Cedex, France
J. L. Demenet
Affiliation:
Laboratoire de Métallurgie Physique (UMR 6630 CNRS), Université de Poitiers, Bd3-Téléport 2, 86960 Futuroscope Cedex, France
J. F. Barbot
Affiliation:
Laboratoire de Métallurgie Physique (UMR 6630 CNRS), Université de Poitiers, Bd3-Téléport 2, 86960 Futuroscope Cedex, France
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Abstract

By scratching the (0001)Si surface of 6H-SiC followed by annealing, dislocations were introduced in the crystal that were subsequently characterized by Transmission Electron Microscopy (TEM). Schottky diodes were then manufactured from the dislocated crystal and their electrical properties were studied by capacitance-voltage (C−V), current-voltage (I−V), and thermally-stimulated capacitance (TSCap) measurements. It was found that the deformation introduces deep traps Maynly located in the upper third of the bandgap promoting a significant increase in the series resistance of the diodes. The as-introduced dislocations were predominantly 30° partials and their core nature was determined to be Si(g) by the technique of Large Angle Convergent Beam Electron Diffraction (LACBED). The compensation effects observed after deformation are presumed to be caused not only by Si(g) dislocations but also by the other defects generated during the deformation step.

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Type
Research Article
Copyright
© EDP Sciences, 1998

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Footnotes

*

This paper was presented at D.E.S. 97 (Poitiers, France, September 4 and 5, 1997).

References

* This paper was presented at D.E.S. 97 (Poitiers, France, September 4 and 5, 1997).

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