Hostname: page-component-788cddb947-w95db Total loading time: 0 Render date: 2024-10-19T12:34:50.375Z Has data issue: false hasContentIssue false

Self-similar solutions for diffusion in semiconductors

Published online by Cambridge University Press:  14 November 2011

L. A. Peletier
Affiliation:
Mathematical Institute, Leiden University, P.O. Box 9512, 2300 RA Leiden, The Netherlands
W. C. Troy
Affiliation:
Department of Mathematics, University of Pittsburgh, Pittsburgh, PA 15260, U.S.A.

Abstract

We study the development of concentration profiles in a semi-infinite slab of semiconductor material after impurities have been implanted uniformly through the slab, under the assumption that, at the face of the slab, no impurities can pass and the vacancy concentration is kept at its equilibrium value. It is shown that profiles of self-similar form exist, and their qualitative shape, as well as their asymptotic properties far from the face of the slab, are determined.

Type
Research Article
Copyright
Copyright © Royal Society of Edinburgh 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1Coddington, E. A. and Levinson, N.. Theory of ordinary differential equations (New York: McGraw Hill, 1955).Google Scholar
2Hearne, M. T.. Diffusion models for the doping of semi-conductor crystals (PhD Thesis, Nottingham University, England, 1988).Google Scholar
3King, J. R.. Mathematical analysis of a model for substitutional diffusion. Proc. Roy. Soc. London Ser. A. 430 (1990), 377404.Google Scholar
4McLeod, J. B. and Serrin, J.. The existence of similar solutions for some laminar boundary layer problems. Arch. Rational Mech. Anal. 31 (1968), 288303.CrossRefGoogle Scholar
5Peletier, L. A. and Troy, W. C.. Self-similar solutions for infiltration of dopant into semiconductors. Arch. Rational Mech. Anal. 116 (1991), 7189.CrossRefGoogle Scholar
6Zahari, M. D. and Tuck, B.. Effect of vacancy reduction on diffusion in semiconductors. J. Phys. D 15 (1982), 17411750.CrossRefGoogle Scholar