Hostname: page-component-8448b6f56d-dnltx Total loading time: 0 Render date: 2024-04-24T05:44:46.268Z Has data issue: false hasContentIssue false

Wafer Bonding of Silicon Carbide and Gallium Nitride

Published online by Cambridge University Press:  21 March 2011

Jaeseob Lee
Affiliation:
Department of Material ScienceNorth Carolina State University, Raleigh, NC 27695
T. E. Cook
Affiliation:
Department of Material ScienceNorth Carolina State University, Raleigh, NC 27695
E. N. Bryan
Affiliation:
Engineering and Department of PhysicsNorth Carolina State University, Raleigh, NC 27695
J. D. Hartman
Affiliation:
Department of Material ScienceNorth Carolina State University, Raleigh, NC 27695
R. F. Davis
Affiliation:
Department of Material ScienceNorth Carolina State University, Raleigh, NC 27695
R. J. Nemanich
Affiliation:
Engineering and Department of PhysicsNorth Carolina State University, Raleigh, NC 27695 Department of Material ScienceNorth Carolina State University, Raleigh, NC 27695, E-mail address: Robert_Nemanich@ncsu.edu
Get access

Abstract

Wafer bonding of SiC and GaN may prove important in the formation of high power heterojunction devices. Results of bonding SiC (C or Si surface) onto GaN (Ga surface) are presented. The samples were n-type 6H SiC and epitaxial n-type 2H(wurzite) GaN grown on SiC. The results demonstrate bonding for both possibilities, but the bonding of the C surface SiC to Ga surface GaN is more readily accomplished. A lower resistance was found for the C-face SiC/Ga-face GaN. The results indicate that the polarity of the interface is important for bonding of these materials.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Pankove, J., Chang, S.S., Lee, H.C., Molnar, R.J., Moustakas, T.D., and Zeghbroeck, B. van, Int. Electron. Dev. Meet. Tech. Dig., pp. 389392 (1994).Google Scholar
2. Chang, S.S., Pankove, J., Leksono, M., and Zeghboeck, V. van, Dev. Res. Conf. Dig. pp. 106107 (1995).Google Scholar
3. Yang, B., Trampert, A., Jenichen, B., Brandt, O., and Poog, K.H., Appl. Phys. Lett., 73(26), 3869, 28 Dec. (1998).Google Scholar
4. Jin-Phillipp, N.Y., Sigle, W., Black, A., Babic, D., Bowers, J.E., Hu, E.L., and Ruhle, M., J. Appl. Phys., 89(2), 1017, 15 Jan. (2001).Google Scholar
5. Capaz, R.B., Lim, H., and Joannopoulos, J.D., Phys. Rev. B., 51(24), 17755, 15 Jun. (1995).Google Scholar
6. Pauling, L., The Nature of the Chemical Bond, 3rd ed., Cornell university Press, Ithaca, NY, p.93 (1960).Google Scholar