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UV-Laser Photoablation Of Thermostable Polymers: Polyimides, Polyphenylquinoxaline and Teflon AF

Published online by Cambridge University Press:  15 February 2011

Sylvain Lazare ,
Hiroyuki Hiraoka ,
Alain Cros  and
Régis Gustiniani
Sylvain Lazare
Affiliation:
Laboratoire de Photochimie et de Photophysique Moléculaire, URA 348 du CNRS, Université de Bordeaux I, 351 cours de la Libération, 33405 Talence, FRANCE
Hiroyuki Hiraoka
Affiliation:
Hong Kong University of Science and Technology, Kowloon, Hong Kong
Alain Cros
Affiliation:
Groupe de Physique des Etats Condensés, URA 783 du CNRS, Faculté des Sciences de Luminy, 13288 Marseille Cédex 9, FRANCE
Régis Gustiniani
Affiliation:
Groupe de Physique des Etats Condensés, URA 783 du CNRS, Faculté des Sciences de Luminy, 13288 Marseille Cédex 9, FRANCE
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Abstract

The UV laser ablation of three thermostable polymers, polyimide, polyphenylquinoxaline and Teflon AF of interest for microelectronics is presented. Direct absorption of the laser beam is not possible by Teflon, but a doping technique is described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 227: Symposium J – Materials Science of High Temperature Polymers for Microelectronics , 1991 , 253
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

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