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UV Photodecomposition for Metal Deposition: Gas Vs. Surface Phase Processes

Published online by Cambridge University Press:  15 February 2011

Thomas H. Wood ,
J. C. White  and
B. A. Thacker
Thomas H. Wood
Affiliation:
Bell Laboratories, Holmdel, New Jersey 07733
J. C. White
Affiliation:
Bell Laboratories, Holmdel, New Jersey 07733
B. A. Thacker
Affiliation:
Bell Laboratories, Holmdel, New Jersey 07733
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Abstract

Photodecomposition of organometallic gases has been shown to be potentially useful for high resolution direct metal deposition. However, a number of problems, particularly the low writing rates, must first be solved. An understanding of the deposition mechanism is essential to this task. In particular, the decomposition must be shown to occur either in the gas phase or in the adsorbed layer. This question can be resolved by the dependence of the writing rate on spot size. Measurements of the process show that once the deposition begins the bulk of the deposit occurs from decomposition in the gas phase.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 17: Symposium I – Laser Diagnostics and Photochemical Processing for Semiconductor Devices , 1982 , 35
Copyright
Copyright © Materials Research Society 1983

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References

REFERENCES

[1] Deutsch, T. F., Ehrlich, D. J., and Osgood, R. M., Jr., Appl. Phys. Lett. 35, 175 (1979).CrossRefGoogle Scholar
[2] Ehrlich, D. J., Osgood, R. M., and Deutsch, T. F., IEEE J. Quantum Electron. QE–16, 1233 (1980).CrossRefGoogle Scholar
[3] Ehrlich, D. J., Osgood, R. M. Jr., and Deutsch, T. F., Appl. Phys. Lett. 36, 698 (1980).CrossRefGoogle Scholar
[4] Ehrlich, D. J., Osgood, R. M. Jr., and Deutsch, T. F., Appl. Phys. Lett. 38, 946 (1981).CrossRefGoogle Scholar
[5] Solanki, R., Boyer, P. K., Mahan, J. E., and Collins, G. J., Appl. Phys. Lett. 38, 572 (1981).CrossRefGoogle Scholar
[6] Ehrlich, D. J. and Osgood, R. M., Chem. Phys. Lett. 79, 381 (1981).CrossRefGoogle Scholar
[7] Chang, T. H. P., J. Vac. Sci. Technol. 12, 1271 (1975).CrossRefGoogle Scholar