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Thermoelectric Power Devices Based on InN Thin Films

Published online by Cambridge University Press:  26 February 2011

Takayuki Matsumoto
Affiliation:
r200570100@kanagawa-u.ac.jp, Kanagawa University, Engineering, 3-27-1 Rokkakubashi Kanagawa-ku Yokohama, Yokohama, 221-8686, Japan
Shigeo Yamaguchi
Affiliation:
yamags18@kanagawa-u.ac.jp, Kanagawa University, Yokohama, 221-8686, Japan
Atsushi Yamamoto
Affiliation:
yamags18@kanagawa-u.ac.jp, AIST, Tsukuba, 305-8568, Japan
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Abstract

We have studied the temperature dependence of thermoelectric properties of amorphous InN thin films prepared by reactive radio-frequency sputtering. We fabricated 60-pair and 120-pair InN-chromel films, which were deposited on polyimide films. For the 120-pair device, the maximum open output voltage and the maximum output power were 210 mV and 65 nW, respectively, at temperature difference of 168 K.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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References

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