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Surface Morphology of Nb Films by Ion Beam Assisted Deposition

Published online by Cambridge University Press:  15 February 2011

Hong Ji ,
Gary S. Was ,
J. Wayne  and
Neville R. Moody
Hong Ji
Affiliation:
Physics Department, University of Michigan, Ann Arbor, MI 48109
Gary S. Was
Affiliation:
Department of Materials Science & Engineering, University of Michigan, Ann Arbor, MI 48109
J. Wayne
Affiliation:
Department of Nuclear Engineering & Radiological Sciences, University of Michigan, Ann Arbor, MI 48109
Neville R. Moody
Affiliation:
Sandia National Laboratories, Livermore, CA 94551-0969
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Abstract

Niobium films of thickness 50 nm to 1000 nm were deposited by ion beam assisted deposition (IBAD) using ion energies of 0, 500 and 1000 eV, and R ratios (ion-to-atom arrival rate ratio) of 0, 0.1, and 0.4 on (100) silicon and (0001) sapphire substrates. The films have columnar structures and the column width increases with normalized energy (En = E × R). The surface morphology depends on both the normalized energy of the ion beam, En, and the film thickness. All films have dome-like surface features that are oriented along the ion beam incident direction. The dimension of these features increases with normalized energy and film thickness. Surface roughness also increases with normalized energy and film thickness, with the root mean square (rms) roughness increasing from 1.6 nm for the PVD sample (100 nm thick) to 36.7 nm for the IBAD film (1000 eV, R = 0.4, 800 nm thick). The surface morphology of IBAD films is the result of a combination of channeling and shadowing effects.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 440: Symposia CA – Structure and Evolution of Surfaces , 1996 , 329
Copyright
Copyright © Materials Research Society 1997

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References

1. Ji, H., Was, G. S., and Jones, J. W., in “Layered materials for Structural Applications”, (Mat. Res. Soc. Proc., Vol. 434, San Francisco, CA, April, 1996)Google Scholar
2. Ji, H., Was, G. S., Jones, J. W., and Moody, Neville R., Nucl. lnstru. for Phys. Res. B, in press.Google Scholar
3. Erck, R. A. and Fenske, G. R., Thin Solid Films, 1989, 181, 521.Google Scholar
4. Cheng, C. C., Erck, R. A., and Fenske, G. R., Mater. Res. Soc. Symp. Proc., 1989, 140, 177.Google Scholar
5. Hsieh, J., Lee, R., Erck, R. A., Fenske, G. R., Su, Y. Y., Marek, M, and Hochman, R. F., Surf. & Coatings Technol., 1991, 49, 8386.Google Scholar
6. Muller, K. H., Phys. Rev. B., 1987, 35, 7906.Google Scholar
7. Terrasi, T., Ravesi, S., Spinella, C., Grimaldi, M. G., and Mantia, A. La, Thin Solid Films, 1994, 241,188.Google Scholar
8. Hsieh, J. H., Wu, W., Erck, R. A., Fenske, G. R., Su, Y. Y., and Marek, M, Surf. & Coatings Technol., 1992, 51,212.Google Scholar
9. Nieuwenhuizen, J. M. and Haanstra, H. B., Philps Tech. Rev., 1966, 27, 87.Google Scholar
10. Dong, L., Smith, R. W., and Srolovitz, D. J., J. of Appl. Phys., in press.Google Scholar
11. Roosendaal, H. S.: in “Sputtering by Particle Bombardment I – Physical Sputtering of Single – Element Solids”, edited by Behrisch, R., Springer – Verlag, 1981, p 219–256.Google Scholar