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Surface Cleaning, Topography, and Temperature Measurements of Single Crystal Diamond

Published online by Cambridge University Press:  21 February 2011

Mark P. D'Evelyn ,
Lisa M. Struck  and
Robin E. Rawles
Mark P. D'Evelyn
Affiliation:
General Electric Corporate Research and Development, P.O. Box 8, Schenectady, NY 12301 and Departments of Chemistry and Materials Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
Lisa M. Struck
Affiliation:
Department of Chemistry and Rice Quantum Institute, Rice University, Houston, TX 77251–1892
Robin E. Rawles
Affiliation:
Department of Chemistry and Rice Quantum Institute, Rice University, Houston, TX 77251–1892
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Abstract

Application of surface science methods to single crystal diamond surfaces requires the preparation of clean, well-ordered surfaces and accurate measurement of substrate temperature. Cleaning of diamond (100) in H2SO4/HNO3/HClO4 produced several infrared absorption features between 1025 and 1275 cm-1, as observed by infrared multiple-internal-reflection spectroscopy. These modes are assigned to surface hydroxyl and bridge-bonded oxygen. Heating an oxidized surface to ca. 1130 °C caused disappearance of a surface hydroxyl mode centered at 1080 cm-1. We show by atomic force microscopy that an as-polished diamond (100) sample is covered by grooves and ridges several nm in height, implying a modest density of atomic steps. The surface of a diamond that underwent etching via numerous adsorption/desorption experiments in ultrahigh vacuum and was acid cleaned several times was essentially unchanged, indicating a minimal perturbation of the surface topography. The capability of Fizeau interferometry for accurate measurement of single-crystal diamond temperatures is demonstrated.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 339: Symposium D – Diamond, Silicon Carbide and Nitride Wide Bandgap Semiconductors , 1994 , 89
Copyright
Copyright © Materials Research Society 1994

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