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Studies of the Early Oxidation of Silicon (111) in Atomic Oxygen*

Published online by Cambridge University Press:  25 February 2011

Bhola N. De ,
Jane Hruska ,
Jane Peterkin ,
Yong Zhao  and
John A. Woollam
Bhola N. De
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511.
Jane Hruska
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511.
Jane Peterkin
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511.
Yong Zhao
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511.
John A. Woollam
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511.
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Abstract

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 163: Symposium G – Impurities, Defects and Diffusion in Semiconductors: Bulk and Layered Structures , 1989 , 965
Copyright
Copyright © Materials Research Society 1990

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Footnotes

*

Research supported by NASA Lewis Research Center Grant No. NAG-3-95.

References

1 Murali, V. and Murarka, S.P., J. Appl. Phys. , 60, 2106 (1986).Google Scholar
2 Hu, S.M., J. Appl. Phys., 55, 4095 (1984).Google Scholar
3 Massoud, H.Z., Plummer, J.D. and Irene, E.A., J. Electrochem. Soc., 132, 2685 (1985); ibid., 132, 2693 (1985).Google Scholar
4 Farres, E., Sune, J., Placencia, I., Barniol, N. and Aymerich, X., phys. stat. sol. (a), 114, 167 (1989).Google Scholar
5 Aptekar, S., Fernandes, M., and Kwong, D.L., J. Electrochem. Soc., 132, 1448 (1985).Google Scholar
6 Lawless, K.R., Rep. Prog. Phys., 37, 231 (1974).Google Scholar
7 Deal, B.E. and Grove, A.S., J. Appl. Phys., 36, 3770 (1965).Google Scholar
8 De, B.N., Zhao, Y., Snyder, P.G., Woollam, J.A., Coutts, T.J. and Li, X., Surface and Coatings Technology, 1990 (accepted).Google Scholar
9 Azzam, R.M.A. and Bashara, N.M., Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1977).Google Scholar
10 Snyder, P.G., Rost, M.C., Bu-Abbud, G.H., Woollam, J.A. and Alterovitz, S.A., J. Appl. Phys., 60, 3293 (1986).Google Scholar
11 Alterovitz, S.A., Woollam, J.A. and Snyder, P.G., Solid State Technol., 31, 99 (1988).Google Scholar
12 Bu-Abbud, G.H., Bashara, N.M. and Woollam, J.A., Thin Solid Films. 138, 27 (1986) .Google Scholar
13 Ash, M. and Ash, I., Eds., Encyclopedia of Plastics, Polymers, and Resins, Vol. II (Chemical Publishing Co., New York, 1982).Google Scholar