Hostname: page-component-76fb5796d-2lccl Total loading time: 0 Render date: 2024-04-25T14:58:31.274Z Has data issue: false hasContentIssue false

Structural, Optical And Electronic Properties Of Semi-Insulating TIN Oxide Thin Films

Published online by Cambridge University Press:  15 February 2011

A. De Acutis
Affiliation:
Dipartimento di Ingegneria Elettronica, Università di Roma ‘La Sapienza’, Via Eudossiana 18, 00184 Roma, Italy.
M. C. Rossi
Affiliation:
Dipartimento di Ingegneria Elettronica, Università di Roma ‘La Sapienza’, Via Eudossiana 18, 00184 Roma, Italy.
M. Barbetti
Affiliation:
Dipartimento di Ingegneria Elettronica, Università di Roma ‘La Sapienza’, Via Eudossiana 18, 00184 Roma, Italy.
Get access

Abstract

Bismuth doped SnO2 films with reproducible optical and electronic properties were deposited by spray-pyrolysis on quartz and glass substrates.Deposition temperatures in the range 300°C–360°C were selected and resistivity values in the range 104−1011Ω/square were obtained. Scanning Electron Microscope (SEM) analysis and X-ray diffractometry showed that samples grown at low temperature are amorphous, while at higher deposition temperature the material structure becomes microcrystalline. The spectral transmittance of the films was measured in the UV-VIS range. The absorption coefficients were interpreted to give values of both direct and indirect band gap. The slope of Tauc's plot, which is commonly related to the degree of disorder in the material, confirmed the SEM observations. Conduction mechanisms were also studied through resistivity measurements as a function of deposition temperature. Results obtained for undoped tin oxide were also investigated for comparison.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Stjerna, B. and Granqvist, C. G., Sol. Energy Mater. 20, 225 (1990)Google Scholar
[2] Reddy, S. Raghunatah, Malik, A. K., and Jawalekar, S. R., Thin Solid Films 143, 113 (1986)Google Scholar
[3] Agashe, Chitra, Takwale, M. G., Marathe, B. R., and Bhide, V. G., Sol. Energy Mater. 17, 99 (1988)Google Scholar
[4] Watanabe, H., Jpn. J. Appl. Phys. 9, 1551 (1970)Google Scholar
[5] Carlson, D. E., J. Electrochem. Soc. 122, 1334 (1975)Google Scholar
[6] Aboaf, J. A., Marcotte, V. C., and Chou, N. J., J. Electrochem. Soc. 120, 701 (1973)Google Scholar
[7] Bruneax, J., Cachet, H., Forment, M., and Messad, A., Thin Solid Films 197, 129 (1991)Google Scholar
[8] Oniya, A. I. and Okeke, C. E., J. Phys. D: Appl. Phys. 22, 1515 (1889)Google Scholar
[9] Tauc, J., Grigorovici, R., Vancu, A., Phys. Stat. Sol., 15, 627 (1966).Google Scholar
[10] Shanti, E., Dutta, V., Banerjee, A., and Chopra, K. L., J. Appl. Phys. 51, 6243 (1980)Google Scholar
[11] Bullot, J. and Schmidt, M. P., Phys. Stat. Sol. (b), 143 (1987)Google Scholar
[12] Leja, E., Acta Physica Polonica, A38, 165 (1970)Google Scholar