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Structural and optical properties of delafossite-type CuAlO2 thin films prepared by RF reactive sputtering
Published online by Cambridge University Press: 26 February 2011
Abstract
Delafossite-type CuAlO2 thin films have been deposited by radio frequency (RF) reactive sputtering on sapphire using a CuAlO2 ceramic target. A study of structural and optical properties was performed on films of varying deposition parameters such as substrate temperature and oxygen partial pressure and also post annealing. The crystalline phase in the films was identified to be the delafossite structure by x-ray diffraction. The optical properties, such as the wavelength dependence of the transmittance and the band gap, were determined. The average transmittance is 80% in the wavelength range of 400-1500 nm and the band gap is 3.81 eV.
Keywords
- Type
- Research Article
- Information
- MRS Online Proceedings Library (OPL) , Volume 905: Symposium DD – Materials for Transparent Electronics , 2005 , 0905-DD05-09
- Copyright
- Copyright © Materials Research Society 2006