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Strategies for the Reduction of Pattern Effects

Published online by Cambridge University Press:  10 February 2011

A. Kerscih ,
T. Schafbauer  and
L. Deutschmann
A. Kerscih
Affiliation:
Siemens AG, Corporate Research and Development, D-81730 Munich
T. Schafbauer
Affiliation:
Siemens AG, Corporate Research and Development, D-81730 Munich
L. Deutschmann
Affiliation:
AST elektronik, D-89160 Dornstadt
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Abstract

The pattern effects in hot processes arise from a spatial variation of the radiative heat flux imbalance between emission and absorption. There are two scenarios to reduce the pattern effect: a very reflective chamber facing the patterned side with an illumination from the backside or a controlled double sided illumination on the other hand. The paper demonstrates the mechanism of both scenarios with a simple mathematical model and discusses the limitations of the approaches. The results will be exemplified with the help of reactor scale simulations involving a detailed Monte Carlo radiation model featuring continuous spectral dependence.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 429: Symposium N – Rapid Thermal and Integrated Processing V , 1996 , 71
Copyright
Copyright © Materials Research Society 1996

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References

Refereneces

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