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A Soft X-Ray Photoemission Study of the Chemisorption and Reaction of Diethylsilane on SI(100)

Published online by Cambridge University Press:  15 February 2011

D. A. Lapiano-Smith ,
F. J. Himpsel  and
L. J. Terminello
D. A. Lapiano-Smith
Affiliation:
IBM, Thomas J. Watson Research Center, Yorktown Heights, N.Y. 10598
F. J. Himpsel
Affiliation:
IBM, Thomas J. Watson Research Center, Yorktown Heights, N.Y. 10598
L. J. Terminello
Affiliation:
Lawrence Livermore National Laboratory, Livermore, CA 94550
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Abstract

Soft x-ray synchrotron radiation has been utilized as the excitation source in a high-resolution photoemission experiment designed to investigate the chemisorption and subsequent reaction of diethylsilane on the technologically important Si(100) surface. We have found that diethylsilane chemisorbs dissociatively to form Si-CH2CH3 surface species on Si(100) following a room temperature exposure. These species are identified by two very sharp peaks observed in the valence band spectra positioned at 17.9 and 14.3 eV binding energy. In addition, C Is core level spectra, measured following exposures of Si(100) substrates as a function of surface temperature, show that carbon, in some form, exists on the Si surface following exposures at every temperature from room temperature to about 600°C. While only -CH2CH3 ethyl groups are observed on the surface at room temperature, these species appear to partially dehydrogenate at 300°C, producing a mixture of -CH2CH3 groups and other intermediate carbonaceous species. At a growth temperature of about 400°C the intermixing of elemental carbon with Si begins. At higher temperatures, we observe the continued degradation of diethylsilane to produce a Si + C alloy on the surface at 600°C. Our results indicate that diethylsilane has potential as a molecular precursor for SiC formation by chemical vapor deposition techniques.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 307: Symposium L – Applications of Synchrotron Radiation Techniques to Materials Science , 1993 , 155
Copyright
Copyright © Materials Research Society 1993

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References

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