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Si(100) Surface Corrosion by NH4F Studied Using High Spatial Resolution Secondary Electron Imaging in a UHV - STEM

Published online by Cambridge University Press:  21 February 2011

Jeff Drucker ,
A. Bandari  and
V.V. Burrows
Jeff Drucker
Affiliation:
Center for Solid State Science, Bio and Materials Engineering Arizona State University, Tempe, AZ 85287
A. Bandari
Affiliation:
Department of Chem, Bio and Materials Engineering Arizona State University, Tempe, AZ 85287
V.V. Burrows
Affiliation:
Center for Solid State Science, Bio and Materials Engineering Arizona State University, Tempe, AZ 85287 Department of Chem, Bio and Materials Engineering Arizona State University, Tempe, AZ 85287
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Abstract

Corrosion of the Si(100) surface by concentrated NH4F solutions was studied using high spatial resolution secondary electron imaging in an ultra-high vacuum scanning transmission electron microscope. Various corrosion mechanisms were investigated by varying the ex-situ chemical treatment of the samples. Entirely different surface morphologies were obtained for surfaces that were kept in solution for short times (-minutes) vs. long times (∼24 hours) and surfaces which were rinsed in DI H2O vs. those which weren't. These measurements confirm that corrosion continues after the samples are removed from the solution and seems to be correlated with the formation of the Si hexafluorometallate salt. This salt is extremely electron beam sensitive and desorbs in UHV at temperatures below 250°C.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 315: Symposium Y – Surface Chemical Cleaning and Passivation for Semiconductor Processing , 1993 , 479
Copyright
Copyright © Materials Research Society 1993

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References

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