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Selective Area Chemical Vapor Deposition of Chromium Oxides

Published online by Cambridge University Press:  14 March 2011

Ruihua Cheng ,
C.N. Borca  and
P.A. Dowben
Ruihua Cheng
Affiliation:
Department of Physics and Astronomy and the Center for Materials Research and Analysis (CMRA), Behlen Laboratory of Physics, University of Nebraska-Lincoln, NE 68588-0111, USA
C.N. Borca
Affiliation:
Department of Physics and Astronomy and the Center for Materials Research and Analysis (CMRA), Behlen Laboratory of Physics, University of Nebraska-Lincoln, NE 68588-0111, USA
P.A. Dowben
Affiliation:
Department of Physics and Astronomy and the Center for Materials Research and Analysis (CMRA), Behlen Laboratory of Physics, University of Nebraska-Lincoln, NE 68588-0111, USA, pdowben@unlserve.unl.edu
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Abstract

We demonstrate that two-phase CrO2 and Cr2O3 thin films can be grown by using selective organometallic chemical vapor deposition through the oxidation of Cr(CO)6 in an oxygen environment. While the magnetization measurements show that both chromium oxides are present, the relative weight of each phase depends on the oxygen partial pressure. Changes of the Curie temperature, Tc, and the saturation magnetization field may be possible by controlling the stoichiometry.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 614: Symposium F – Magnetic Materials, Structures & Processing for Information… , 2000 , F10.4.1
Copyright
Copyright © Materials Research Society 2000

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References

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