Hostname: page-component-8448b6f56d-tj2md Total loading time: 0 Render date: 2024-04-24T09:18:46.150Z Has data issue: false hasContentIssue false
  • English
  • Français

Ruthenium Sputter Deposition on Organosilicate Glass and on Paralyne: an XPS Study of Interfacial Chemistry, Nucleation and Growth

Published online by Cambridge University Press:  17 March 2011

Get access

Abstract

The interactions of sputter-deposited ruthenium with organosilicate glass (OSG) at 300 K have been studied by x-ray photoelectron spectroscopy (XPS) for Ru coverages from ∼ 0.1 monolayer to several monolayers, using in-situ sample transfer between the deposition and analysis chambers. The results indicate Stranski-Krastanov (SK) type growth, with the completion of the first layer of Ru at an average thickness corresponding to 1 monolayer average coverage. Ru(0) is the only electronic state present. XPS core level spectra indicate weak chemical interactions between Ru and the substrate. A less pronounced tendency towards SK growth was observed for Ru deposition on parylene. Deposition of Ru on OSG followed by electroless deposition of Cu resulted in the formation of a shiny copper film that failed the Scotch Tape test. Results indicate failure mainly at the Ru/OSG interface.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 812: Symposium F – Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics-2004 , 2004 , F2.5
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Chyan, O., Arunagirl, T. N., Ponnuswamy, T., J. Electrochemical Society 150 (2003) C347.CrossRefGoogle Scholar
[2] Tong, J., Martini, D., Magtoto, N., Kelber, J., J. Vacuum Science and Technology B21 (2003) 293.CrossRefGoogle Scholar
[3] Shepherd, K., Kelber, J., Applied Surface Science 151 (1999) 287.CrossRefGoogle Scholar
[4] Zhao, X., Leavy, M., Magtoto, N. P., Kelber, J. A., Appl. Phys. Lett. 79 (2001) 3479.CrossRefGoogle Scholar
[5] Lu, T.-M., Rensselaer Polytechnic Institute, private commuciation.Google Scholar
[6] Moulder, J. F., Stickle, W. F., Sobol, P. E., Bomben, K. D., Handbook of X-ray Photoelectron Spectroscopy, Physical Electronics, Eden Prairie, Minnesota, 1995.Google Scholar
[7] Madhavaram, H., Idriss, H., Wendt, S., Kim, Y. D., Knapp, M., Over, H., Asman, J., Loffler, E., Muhler, M., Journal of Catalysis 202 (2001) 296.CrossRefGoogle Scholar
[8] Argile, S., Rhead, G. E., Surf. Sci. Repts. 10 (1989) 277.CrossRefGoogle Scholar
[9] Niu, C., Magtoto, N. P., Kelber, J. A., Jennison, D. R., Bogicevic, A., Surface Science 465 (2000) 163.CrossRefGoogle Scholar
[10] Pritchett, M., Magtoto, N., Tong, J., Zhao, X., Kelber, J. A., Thin Solid Films 440 (2003) 100.CrossRefGoogle Scholar
[11] Yang, G. R., Lu, T.-M., Appl. Phys. Lett. 72 (1998) 1846.CrossRefGoogle Scholar
[12] Baumer, M., Freund, H.-J., Progress in Surface Science 61 (1999) 127.CrossRefGoogle Scholar