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RF-MBE Growth of InN Dots on N-polar GaN Grown on Vicinal c-plane Sapphire

Published online by Cambridge University Press:  01 February 2011

Naoki Hashimoto
Affiliation:
Department of Electronics and Mechanical Engineering
Naohiro Kikukawa
Affiliation:
Department of Electronics and Mechanical Engineering
Song-Bek Che
Affiliation:
Department of Electronics and Mechanical Engineering Center for Frontier Electronics and Photonics InN-project as a CREST program of JST, Chiba University 1–33 Yayoi-cho, Inage-ku, Chiba 263–8522, Japan
Yoshihiro Ishitani
Affiliation:
Department of Electronics and Mechanical Engineering Center for Frontier Electronics and Photonics InN-project as a CREST program of JST, Chiba University 1–33 Yayoi-cho, Inage-ku, Chiba 263–8522, Japan
Akihiko Yoshikawa
Affiliation:
Department of Electronics and Mechanical Engineering Center for Frontier Electronics and Photonics InN-project as a CREST program of JST, Chiba University 1–33 Yayoi-cho, Inage-ku, Chiba 263–8522, Japan
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Abstract

We have grown InN quantum dots (QDs) on nitrogen-polarity (N-polarity) GaN under-layer by the radio-frequency plasma-assisted molecular beam epitaxy (RF-MBE), and systematically investigated growth mechanism of the InN dots. The InN QDs with the N-polarity could be grown at about 500°C, which was much higher than that of previous reports on InN dots grown by MBE. When the nominal coverage of InN became more than 1 mono-layer (ML), lattice relaxation of InN occurred and high density InN dots were uniformly formed. These results indicated that InN dots were formed by Stranski-Krastanov (S-K) growth mode. For the InN deposition above about 8ML, InN dots tended to coalesce and resulted in remarakable decrease of the dots density.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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References

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