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Redistribution Effects for OMVPE InP/GaAs

Published online by Cambridge University Press:  26 February 2011

OH Tae-IL  and
Wallace B. Leigh
OH Tae-IL
Affiliation:
Department of Applied Physics, Oregon Graduate Center, 19600 NW von Neumann, Beaverton, Or 97006
Wallace B. Leigh
Affiliation:
Division of Electrical Engineering, Alfred University, Alfred, NY 14802
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Abstract

We have analyzed the redistribution parameters for InP grown by organometallic vapor phase epitaxy (OMVPE) on GaAs substrates. The layers, grown using (trimethyl Indium) TMIn at atmospheric pressure, have been characterized for epitaxial quality using photoluminescence, energy dispersed x-ray analysis, and optical microscopy. In order to better understand the effects of inter-diffusion and inter-mixing for the GaAs into the InP epitaxial layer, the layer-substrate interface was first probed by growing consecutive samples of InP for increasingly longer growth times, and thus characterizing the layers as one moves away from the interface. For more detailed analysis, cross-sections of the InP/GaAs interface were prepared for scanning transmission electron microscopy (STEM). Energy dispersed x-ray analysis has shown that all elements In, Ga, As, and P, are present on the epitaxial side of the interface, while only Ga and As are present on the substrate side. A combination of electron diffraction and luminescence measurements show the epitaxy is at least 80% InP at the interface and essentially 100% InP at a distance of 6000Å into the epilayer. Electron diffraction and bright field investigation at the interface show the existence of a second phase, existing in a mostly InP matrix. The effects of redistribution in heteroepitaxial InP/GaAs will be discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 144: Symposium W – Advances in Materials, Processing and Devices in III-V Compound Semiconductors , 1988 , 79
Copyright
Copyright © Materials Research Society 1989

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References

REFERENCES

1. van der Merwe, J.H. and van der Berg, N.G., Surf. Sci. 32, 1 (1972).Google Scholar
2. Matthews, J.W., Mader, S. and Light, T.B., J Appl. Phys. 41 (1970).CrossRefGoogle Scholar
3. Lee, M.K., Wuu, D.S. and Tung, H.H., J Appl. Phys 62, 3209 (1987).CrossRefGoogle Scholar
4. Teng, S.J.J., Ballingall, J.M., Rosenbaum, F.J., Appl. Phys. Lett 48, 1217 (1986).CrossRefGoogle Scholar
5. Bacher, F.R., and Leigh, W.B., J. Crystal Growth, 80 456 (1987).CrossRefGoogle Scholar
6. Bacher, F.R., Cholan, H. and Leigh, W.B., Proceeds of Materials Research Society, volume 90, p. 5 (1987).CrossRefGoogle Scholar
7. van de Ven, J., Weyher, J.L., Ikink, H. and Giling, J., J. Electrochem Soc. 134, 989 (1987).CrossRefGoogle Scholar
8. Mukai, S., Yajima, H., Shimada, J., Jpn J. Appl. Phys 20, 10001 (1981).Google Scholar
9. Hiramatsu, K., Tomita, K., Sawaki, N., Akasaki, I., Jap J. Appl. Phys. 23, 68 (1984).CrossRefGoogle Scholar
10. Stringfellow, G.B., J. Appl. Phys. 43, 3455 (1972).CrossRefGoogle Scholar
11. Chew, N.G. and Cullis, A.G., Ultramicroscopy 23, 175 (1987).CrossRefGoogle Scholar
12. Olsen, G.H., Zamerowski, T.Z., Smith, R.T. and Bertin, E.P., J. Electron Mat. 9, 977 (1980).CrossRefGoogle Scholar