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Recent Advances in The Application of Focused Ion Beams
Published online by Cambridge University Press: 25 February 2011
Abstract
Recent advances of focused ion beam systems and their applications are presented. The applications include maskless ion implantation and various maskless patterning techniques which make use of ion induced chemical effects. These are ion beam assisted etching, deposition and ion beam modification techniques and are promising to improve patterning speed and extend applications of focused ion beams.
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- Research Article
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- Copyright © Materials Research Society 1985
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