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Rapid Growth of Ceramic Films by Particle-Vapor Codeposition

Published online by Cambridge University Press:  15 February 2011

Robert H. Hurt  and
Mark D. Allendorf
Robert H. Hurt
Affiliation:
Combustion Research Facility, Sandia National Laboratories, 8361 Livermore, California 94551-0969
Mark D. Allendorf
Affiliation:
Combustion Research Facility, Sandia National Laboratories, 8361 Livermore, California 94551-0969
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Abstract

Particle-enhanced chemical vapor deposition (PECVD) is capable of producing ceramic films at high deposition rates. A mathematical model of the particle-vapor codeposition process has been developed and has been applied to PECVD processes to predict deposition rate enhancements and deposit properties.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 250: Symposium R – Chemical Vapor Deposition of Refractory Metals and Ceramics II , 1991 , 59
Copyright
Copyright © Materials Research Society 1992

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References

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