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Raman Characterization of Protocrystalline Silicon Films

Published online by Cambridge University Press:  31 January 2011

A. J. Syllaios ,
S. K. Ajmera ,
G. S. Tyber ,
C. L. Littler  and
R. E. Hollingworth
A. J. Syllaios
Affiliation:
aj.syllaios@L-3com.com, L-3 Communications Infrared Products, Dallas, Texas, United States
S. K. Ajmera
Affiliation:
Sameer.Ajmera@L-3com.com, L-3 Communications Infrared Products, Dallas, Texas, United States
G. S. Tyber
Affiliation:
Gregory.Tyber@L-3com.com, L-3 Communications Infrared Products, Dallas, Texas, United States
C. L. Littler
Affiliation:
Christopher.Littler@unt.edu, University of North Texas, Department of Physics, Denton, Texas, United States
R. E. Hollingworth
Affiliation:
RHollingsworth@itnes.com, ITN Energy Systems, Littleton, Colorado, United States
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Abstract

An increasingly important application of thin film hydrogenated amorphous silicon (α-Si:H) is in infrared detection for microbolometer thermal imaging arrays. Such arrays consist of thin α-Si:H films that are integrated into a floating thermally isolated membrane structure. Among the α-Si:H material properties affecting the design and performance of microbolometers is the microstructure. In this work, Raman spectroscopy is used to study changes in the microstructure of protocrystalline p-type α-Si:H films grown by PECVD as substrate temperature, dopant concentration, and hydrogen dilution are varied. The films exhibit the four Raman spectral peaks corresponding to the TO, LO, LA, and TA modes. It is found that the TO Raman peak becomes increasingly well defined (decreasing line width and increasing intensity), and shifts towards the crystalline TO energy as substrate temperature is increased, H dilution of the reactants is increased, or as dopant concentration is decreased.

Keywords

amorphousRaman spectroscopyplasma-enhanced CVD (PECVD) (deposition)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1153: Symposium A – Amorphous and Polycrystalline Thin Film Silicon Science and Technology–2009 , 2009 , 1153-A16-04
Copyright
Copyright © Materials Research Society 2009

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