Hostname: page-component-78c5997874-j824f Total loading time: 0 Render date: 2024-11-17T21:39:03.093Z Has data issue: false hasContentIssue false

Pulsed Laser Deposition of Magneto-Optic Material

Published online by Cambridge University Press:  16 February 2011

K. B. Erington
Affiliation:
Center for Microelectronic and Optical Materials Research, Dept. of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, NE 68688.
W. Mcgahan
Affiliation:
Center for Microelectronic and Optical Materials Research, Dept. of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, NE 68688.
N. J. Ianno
Affiliation:
Center for Microelectronic and Optical Materials Research, Dept. of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, NE 68688.
J. A. Woollam
Affiliation:
Center for Microelectronic and Optical Materials Research, Dept. of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, NE 68688.
Get access

Abstract

A wide range of materials can be deposited by Pulsed Laser Deposition. We will discuss the deposition of materials that can be employed in magneto-optic systems. These materials include dysprosium, cobalt, and aluminum nitride. We will present the results of our work involving the fabrication of multilayer structures of the previously mentioned material. These structures and materials have been characterized by a scanning electron microscope (SEM) and X-ray diffractometry

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Sellmyer, D. J., Woollam, J. A., Shan, A. S., and McGahan, W. A., Mat. Res. Soc. Symp. Proc. 150, 51 (1989).Google Scholar
2. McGahan, W. A., Chen, L., Shan, Z. S., Sellmyer, D. J., and Woollam, J. A., Appl. Phys. Lett. 55, 24 (1989).Google Scholar
3. Erington, K. B. and lanno, N. J., submitted to J. Vac. Sci. and Tech. (B).Google Scholar
4. Erington, K. B. and Ianno, N. J., these proceedings.Google Scholar
5. Eryu, O., \Murakami, K., and Masuda, K., Appl- Phys. Lett. 54, 26 (1989).Google Scholar
6. Kelly, R. and Rothenberg, J. E., Nucl. Instrum. Meth. B7/8 (1985) 755763.Google Scholar
7. Pekny, T., MS thesis, University of Nebraska, 1990.Google Scholar
8. Shan, Z. S. and Sellmyer, D. J., J. Appl. Phys. 64, 10 (1988).Google Scholar